Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some … Wikipedia
Thin film — A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. Electronic semiconductor devices and optical coatings are the main applications benefiting from thin film construction. A… … Wikipedia
Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… … Wikipedia
Ion beam assisted deposition — or IBAD or IAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Besides providing… … Wikipedia
Secondary ion mass spectrometry — Infobox chemical analysis name = Secondary ion mass spectrometry caption =CAMECA IMS3f Magnetic SIMS Instrument acronym = SIMS classification =Mass spectrometry analytes = Solid surfaces, thin films related = Fast atom bombardment… … Wikipedia
High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… … Wikipedia
Dünnschichtsputtern — joninis plonojo sluoksnio dulkinimas statusas T sritis radioelektronika atitikmenys: angl. thin film ion sputtering vok. Dünnschichtsputtern, n rus. ионное напыление тонкой плёнки, n pranc. évaporation ionique de couche mince, f … Radioelektronikos terminų žodynas
joninis plonojo sluoksnio dulkinimas — statusas T sritis radioelektronika atitikmenys: angl. thin film ion sputtering vok. Dünnschichtsputtern, n rus. ионное напыление тонкой плёнки, n pranc. évaporation ionique de couche mince, f … Radioelektronikos terminų žodynas
évaporation ionique de couche mince — joninis plonojo sluoksnio dulkinimas statusas T sritis radioelektronika atitikmenys: angl. thin film ion sputtering vok. Dünnschichtsputtern, n rus. ионное напыление тонкой плёнки, n pranc. évaporation ionique de couche mince, f … Radioelektronikos terminų žodynas
ионное напыление тонкой плёнки — joninis plonojo sluoksnio dulkinimas statusas T sritis radioelektronika atitikmenys: angl. thin film ion sputtering vok. Dünnschichtsputtern, n rus. ионное напыление тонкой плёнки, n pranc. évaporation ionique de couche mince, f … Radioelektronikos terminų žodynas
